ML5017 Thin Film Technology Syllabus:
ML5017 Thin Film Technology Syllabus – Anna University Regulation 2021
COURSE OBJECTIVES:
The main learning objective of this course is to prepare the students for:
• Acquiring a comprehensive knowledge on the basics involved in thin films and development of thin films.
• Getting acquainted with the various methods of preparation of thin films.
• Explaining the methods of deposition monitoring and control and its importance.
• Gaining knowledge on the surface modification technologies of deposition of thin film for different application like optical emission, abrasion resistance, dielectric, electronic applications, energy conversion, etc.
• Knowing the applications of thin films in various fields.
UNIT I BASICS OF THIN FILMS
Cosine law of emission.Emission from a point source.Mass of material condensing on the substrate. Chemical methods: Qualitative study of preparation of thin films by Electroplating, vapour phase growth and anodization. Physical methods: Vacuum evaporation
UNIT II PREPARATION OF THIN FILMS
Study of thin film vacuum coating unit – Construction and uses of vapour sources-wire, sublimation, crucible and electron bombardment heated sources. Arc and Laser evaporation. Sputtering – Study of glow Discharge – Physical nature of sputtering – Sputtering yield- Experimental set up for DC sputtering, AC sputtering and RF sputtering. Nucleation and growth of thin films (qualitative study only): Four stages of film growth.
UNIT III DEPOSITION MONITORING AND CONTROL
Microbalance, Crystal oscillator thickness monitor, optical monitor, Resistance Monitor. Thickness measurement: Multiple Beam Interferometer, Fizeau (Tolansky) technique – Fringes of equal chromatic order (FECO) method – Ellipsometry (qualitative only).
UNIT IV PROPERTIES OF THIN FILM
Sheet resistance – size effect – Electrical conduction in thin metallic films.Effect of Ageing and Annealing – Oxidation – agglomeration. Dielectric properties: DC conduction mechanism – Low field and high field conduction. Breakdown mechanism in dielectric films – AC conduction mechanism. Temperature dependence of conductivity. Optical properties: Optical constants and their determination – Spectrophotometer method. Anti-reflection coatings. Interference filters. Thin film Solar Cells CuInSe2 solar cell.
UNIT V APPLICATION OF THIN FILMS
Thin film resistors: Materials and Design of thin film resistors (Choice of resistor and shape and area) – Trimming of thin film resistors – sheet resistance control – Individual resistor trimming. Thin film capacitors: Materials – Capacitor structures – Capacitor yield and capacitor stability. Thin film field effect transistors: Fabrication and characteristics – Thin film diodes.
TOTAL: 45 PERIODS
COURSE OUTCOMES:
Upon completion of the course, the students will be able to
• Explain the fundamental principles of Thin film technology.
• Compare the various techniques of preparation of thin films with respect to the processes, advantages, limitations and applications.
• Interpret the results obtained from Microbalance, Crystal oscillator thickness monitor, optical monitor, Resistance Monitor and Thickness measurements.
• Interpret the effect of size of thin films and ageing and annealing on the optical and conductive properties of thin films.
• Identify suitable surface modification technologies of deposition of thin film for different application like optical emission, abrasion resistance, dielectric, electronic applications, energy conversion, etc.
TEXT BOOKS
1. Goswami A, “Thin Film Fundamentals”, New Age International (P) Ltd., 1996.
2. K.L. Chopra, “Thin Film Phenomena”, McGraw-Hill,1983
REFERENCES
1. AichaElshabini-Riadaud Fred D Barlow III, “Thin Film Technology Hand book”, Mc Graw Hill Company, 1997.
2. Anders H, “Thin Films in Optics”, Focal press, 1967.
3. Guthrie A, “Vacuum Technology”, John Wiley and Sons, 1963.
4. Maissel L.I and Glang R, “Hand Book of Thin Film Technology”, McGraw Hill, 1970.
5. Rao V V, Ghosh, T.B., Chopra, K.L., “Vacuum Science and Technology”, Allied Publications, 1998
6. Schwartz B and Schwartz N, “Measurement Techniques for Thin Films”, John Wiley & Sons, 1967.